Buy this book on-line Tanabe, Hiroyoshi : Photomask And Next-generation Lithpgraphy Mask Technology (Proceedings of SPIE Volume 5446) Part One & TwoSociety of Photo Optical, Bellingham, Washington, U.S.A., 2004 ISBN 0819453692
4to - over 9¾ - 12" tall. 0819453692 | 2 VOLUME SET Still in shrinkwrap. Yellow covers.. Book. Book Condition: Very Good Condition. Binding: Soft cover Click here for full details of this book, to ask a question or to buy it on-line. Bibliophile Bookbase probably offers multiple copies of Tanabe, Hiroyoshi : Photomask And Next-generation Lithpgraphy Mask Technology (Proceedings of SPIE Volume 5446) Part One & Two. Click here to select from a complete list of available copies of this book. Bibliophile Bookbase lists over 5 million books, maps and prints including first editions, livres illustrées, out-of-print books, fine bindings and atlases. Bibliophile Bookbase for antiquarian books, maps and prints. |